國際簡稱:OPT LASER TECHNOL 參考譯名:光學和激光技術
主要研究方向:物理-光學 非預警期刊 審稿周期: 約2.1個月 約9周
《光學和激光技術》(Optics And Laser Technology)是一本由Elsevier Ltd出版的以物理-光學為研究特色的國際期刊,發(fā)表該領域相關的原創(chuàng)研究文章、評論文章和綜述文章,及時報道該領域相關理論、實踐和應用學科的最新發(fā)現(xiàn),旨在促進該學科領域科學信息的快速交流。該期刊是一本未開放期刊,近三年沒有被列入預警名單。該期刊享有很高的科學聲譽,影響因子不斷增加,發(fā)行量也同樣高。
Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication.
The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas:
?development in all types of lasers
?developments in optoelectronic devices and photonics
?developments in new photonics and optical concepts
?developments in conventional optics, optical instruments and components
?techniques of optical metrology, including interferometry and optical fibre sensors
?LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow
?applications of lasers to materials processing, optical NDT display (including holography) and optical communication
?research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume)
?developments in optical computing and optical information processing
?developments in new optical materials
?developments in new optical characterization methods and techniques
?developments in quantum optics
?developments in light assisted micro and nanofabrication methods and techniques
?developments in nanophotonics and biophotonics
?developments in imaging processing and systems
CiteScore | SJR | SNIP | CiteScore 指數(shù) | ||||||||||||||||
8.3 | 0.874 | 1.577 |
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名詞解釋:CiteScore 是衡量期刊所發(fā)表文獻的平均受引用次數(shù),是在 Scopus 中衡量期刊影響力的另一個指標。當年CiteScore 的計算依據是期刊最近4年(含計算年度)的被引次數(shù)除以該期刊近四年發(fā)表的文獻數(shù)。例如,2022年的 CiteScore 計算方法為:2022年的 CiteScore =2019-2022年收到的對2019-2022年發(fā)表的文件的引用數(shù)量÷2019-2022年發(fā)布的文獻數(shù)量 注:文獻類型包括:文章、評論、會議論文、書籍章節(jié)和數(shù)據論文。
Top期刊 | 綜述期刊 | 大類學科 | 小類學科 | ||
是 | 否 | 物理與天體物理 | 2區(qū) | OPTICS 光學 PHYSICS, APPLIED 物理:應用 | 2區(qū) 2區(qū) |
Top期刊 | 綜述期刊 | 大類學科 | 小類學科 | ||
否 | 否 | 物理與天體物理 | 2區(qū) | OPTICS 光學 PHYSICS, APPLIED 物理:應用 | 2區(qū) 2區(qū) |
Top期刊 | 綜述期刊 | 大類學科 | 小類學科 | ||
否 | 否 | 物理與天體物理 | 2區(qū) | OPTICS 光學 PHYSICS, APPLIED 物理:應用 | 2區(qū) 2區(qū) |
Top期刊 | 綜述期刊 | 大類學科 | 小類學科 | ||
否 | 否 | 物理 | 2區(qū) | OPTICS 光學 PHYSICS, APPLIED 物理:應用 | 2區(qū) 3區(qū) |
Top期刊 | 綜述期刊 | 大類學科 | 小類學科 | ||
否 | 否 | 物理與天體物理 | 2區(qū) | OPTICS 光學 PHYSICS, APPLIED 物理:應用 | 2區(qū) 2區(qū) |
Top期刊 | 綜述期刊 | 大類學科 | 小類學科 | ||
否 | 否 | 物理與天體物理 | 2區(qū) | OPTICS 光學 PHYSICS, APPLIED 物理:應用 | 2區(qū) 2區(qū) |
按JIF指標學科分區(qū) | 收錄子集 | 分區(qū) | 排名 | 百分位 |
學科:OPTICS | SCIE | Q1 | 21 / 119 |
82.8% |
學科:PHYSICS, APPLIED | SCIE | Q2 | 45 / 179 |
75.1% |
按JCI指標學科分區(qū) | 收錄子集 | 分區(qū) | 排名 | 百分位 |
學科:OPTICS | SCIE | Q1 | 20 / 120 |
83.75% |
學科:PHYSICS, APPLIED | SCIE | Q1 | 29 / 179 |
84.08% |
Author: Yu, Jinsu; Chen, Jiangyi; Ho, Hsinshen
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108721
Author: Wang, Xi-xin; Lv, Ri-qing; Zhao, Yong; Zhao, Jian; Lin, Zi-ting
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108748
Author: Sattar, Harse; Ran, Hai; Hu, Zhenlin; Guan, Feiyu; Imran, Muhammad; Guo, Lianbo; Luo, Wei; Ding, Hongbin
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108741
Author: Liu, Yayun; Zhu, Qi; Wang, Chuanyang; Li, Jiaqiang
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108774
Author: Lu, Yang; Deng, Yuchun; Shi, Lin; Jiang, Laihege; Gao, Ming
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.109003
Author: Sun, Shijie; Che, Yuanhua; Zhu, Mu; Lian, Tianhang; Sun, Xueqing; Wang, Xibin; Huang, Quandong; Zhang, Daming
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.109017
Author: Han, Lei; Gao, Qiang; Li, Bo; Li, Zhongshan
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.109014
Author: Xu, Mengbing; Ma, Hao; Zhong, Xueting; Zhao, Qun; Chen, Siyun; Zhong, Ruofei
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108950
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