Plasma Chemistry And Plasma Processing SCIE

國(guó)際簡(jiǎn)稱：PLASMA CHEM PLASMA P 參考譯名：等離子化學(xué)和等離子處理

主要研究方向：工程技術(shù)-工程：化工非預(yù)警期刊審稿周期：較慢,6-12周

《等離子化學(xué)和等離子處理》(Plasma Chemistry And Plasma Processing)是一本由Springer US出版的以工程技術(shù)-工程：化工為研究特色的國(guó)際期刊，發(fā)表該領(lǐng)域相關(guān)的原創(chuàng)研究文章、評(píng)論文章和綜述文章，及時(shí)報(bào)道該領(lǐng)域相關(guān)理論、實(shí)踐和應(yīng)用學(xué)科的最新發(fā)現(xiàn)，旨在促進(jìn)該學(xué)科領(lǐng)域科學(xué)信息的快速交流。該期刊是一本未開放期刊，近三年沒有被列入預(yù)警名單。

3區(qū) 中科院分區(qū)
Q2 JCR分區(qū)
123 年發(fā)文量
2.6 IF影響因子
未開放 是否OA
57 H-index
1981 創(chuàng)刊年份
Quarterly 出版周期
English 出版語(yǔ)言

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

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Plasma Chemistry And Plasma Processing期刊信息

ISSN：0272-4324
出版語(yǔ)言：English
是否OA：未開放
E-ISSN：1572-8986
出版地區(qū)：UNITED STATES
是否預(yù)警：否
出版商：Springer US
出版周期：Quarterly
創(chuàng)刊時(shí)間：1981
開源占比：0.0935
Gold OA文章占比：14.18%
OA被引用占比：0.0820...
出版國(guó)人文章占比：0.18
出版撤稿占比：0
研究類文章占比：95.12%

Plasma Chemistry And Plasma Processing CiteScore評(píng)價(jià)數(shù)據(jù)（2024年最新版）

CiteScore

SJR

SNIP

CiteScore 指數(shù)

5.9

0.48

0.912

學(xué)科類別	分區(qū)	排名	百分位
大類：Physics and Astronomy 小類：Condensed Matter Physics	Q1	108 / 434	75%
大類：Physics and Astronomy 小類：Surfaces, Coatings and Films	Q2	34 / 132	74%
大類：Physics and Astronomy 小類：General Chemical Engineering	Q2	79 / 273	71%
大類：Physics and Astronomy 小類：General Chemistry	Q2	119 / 408	70%

名詞解釋：CiteScore 是衡量期刊所發(fā)表文獻(xiàn)的平均受引用次數(shù)，是在 Scopus 中衡量期刊影響力的另一個(gè)指標(biāo)。當(dāng)年CiteScore 的計(jì)算依據(jù)是期刊最近4年（含計(jì)算年度）的被引次數(shù)除以該期刊近四年發(fā)表的文獻(xiàn)數(shù)。例如，2022年的 CiteScore 計(jì)算方法為：2022年的 CiteScore =2019-2022年收到的對(duì)2019-2022年發(fā)表的文件的引用數(shù)量÷2019-2022年發(fā)布的文獻(xiàn)數(shù)量注：文獻(xiàn)類型包括：文章、評(píng)論、會(huì)議論文、書籍章節(jié)和數(shù)據(jù)論文。

Plasma Chemistry And Plasma Processing中科院評(píng)價(jià)數(shù)據(jù)

中科院 2023年12月升級(jí)版

Top期刊	綜述期刊	大類學(xué)科		小類學(xué)科
否	否	物理與天體物理	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區(qū) 3區(qū) 3區(qū)

中科院 2022年12月升級(jí)版

Top期刊	綜述期刊	大類學(xué)科		小類學(xué)科
否	否	工程技術(shù)	3區(qū)	PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體 ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用	2區(qū) 3區(qū) 3區(qū)

中科院 2021年12月舊的升級(jí)版

Top期刊	綜述期刊	大類學(xué)科		小類學(xué)科
否	否	工程技術(shù)	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區(qū) 3區(qū) 3區(qū)

中科院 2021年12月基礎(chǔ)版

Top期刊	綜述期刊	大類學(xué)科		小類學(xué)科
否	否	工程技術(shù)	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	4區(qū) 3區(qū) 2區(qū)

中科院 2021年12月升級(jí)版

Top期刊	綜述期刊	大類學(xué)科		小類學(xué)科
否	否	工程技術(shù)	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區(qū) 3區(qū) 3區(qū)

中科院 2020年12月舊的升級(jí)版

Top期刊	綜述期刊	大類學(xué)科		小類學(xué)科
否	否	工程技術(shù)	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區(qū) 3區(qū) 3區(qū)

Plasma Chemistry And Plasma Processing JCR評(píng)價(jià)數(shù)據(jù)（2023-2024年最新版）

按JIF指標(biāo)學(xué)科分區(qū)	收錄子集	分區(qū)	排名	百分位
學(xué)科：ENGINEERING, CHEMICAL	SCIE	Q3	91 / 170	46.8%
學(xué)科：PHYSICS, APPLIED	SCIE	Q2	81 / 179	55%
學(xué)科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	12 / 40	71.3%

按JCI指標(biāo)學(xué)科分區(qū)	收錄子集	分區(qū)	排名	百分位
學(xué)科：ENGINEERING, CHEMICAL	SCIE	Q2	55 / 171	68.13%
學(xué)科：PHYSICS, APPLIED	SCIE	Q2	69 / 179	61.73%
學(xué)科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	17 / 40	58.75%

Plasma Chemistry And Plasma Processing歷年數(shù)據(jù)統(tǒng)計(jì)

影響因子

中科院分區(qū)

Plasma Chemistry And Plasma Processing中國(guó)學(xué)者發(fā)文選摘

1、Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst
Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 183-197. DOI: 10.1007/s11090-022-10282-y
2、Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma
Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 381-400. DOI: 10.1007/s11090-022-10295-7
3、Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System
Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 99-110. DOI: 10.1007/s11090-022-10297-5
4、A RF plasma source with focused magnetic field for material treatment
Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 329-345. DOI: 10.1007/s11090-022-10300-z
5、Influence Mechanism of O-2/H2O Adsorption on Cu(111) Surface on SF6 Overheating Failure Decomposition
Author: Zeng, Fuping; Kexin Zhu; Su, Dazhi; Feng, Xiaoxuan; Guo, Xinnuo; Yao, Qiang; Tang, Ju

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 67-80. DOI: 10.1007/s11090-022-10305-8
6、Synergistic 2,4-D Degradation by Fenton Reagent Obtained from Glow Discharge Plasma Formed H2O2 and DBD Pretreated Fe-Rich Sludge Catalyst
Author: Huang, Shaoyong; Huang, Quanjia; Gan, Jiaming; Li, Ting; Wang, Lei

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 491-511. DOI: 10.1007/s11090-022-10306-7
7、Hydrodeoxygenation of o-Cresol Over Mo2C Modified by O-2 Plasma
Author: Yu, Zihan; Yu, Zhiquan; Wang, Yao; Liu, Yingya; Wang, Anjie

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 533-545. DOI: 10.1007/s11090-022-10310-x
8、Theoretical Study on the Degradation Pathways of Unsymmetrical Dimethylhydrazine by Aqueous O-3
Author: Luo, Santu; Fu, Yuwei; Zhang, Mingyan; Liu, Yifan; Wang, Diankai; Zhang, Jiawei; Liu, Dingxin; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 81-97. DOI: 10.1007/s11090-022-10307-6